Selective inhibition of polymerization enables sub-diffraction optical lithography
Authors: Harke B., Bianchini P., Anjum F., Brandi F., Diaspro A.
Autors Affiliation: Italian Institute of Technology, Dept. Nanophysics, Genoa, Italy; Department of Physics, University of Genoa, Genoa, Italy
Abstract: We show that after two-photon excitation of the photo initiator we are able to inhibit the polymerization process with a second beam of different wavelength. For achieving sub-diffraction resolution this is one of the key elements. Remarkably is that these experiments can be performed with a commercially available STED microscope slightly modified for two-photon-excitation (TPE). First experiments featuring an enhanced resolution will be presented.
KeyWords: Two-Photon-Lithography; Nanoscopy; Sub-diffraction writingDOI: 10.1117/12.878961