Photopolymerization inhibition dynamics for sub-diffraction direct laser writing lithography

Year: 2012

Authors: Harke B., Bianchini P., Brandi F., Diaspro A.

Autors Affiliation: Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy;
Department of Physics, University of Genova, 16146 Genova, Italy

Abstract: Selective inhibition of the polymerization leads to sub-diffraction feature sizes in direct writing lithography-a principle based on the idea of stimulated emission depletion (STED) microscopy. However, the detailed understanding of the inhibition process is a key point to further enhance the resolution of the system. The authors present experiments focused on the time dynamics of the inhibition process, clarifying possible photophysical pathways.

Journal/Review: CHEMPHYSCHEM

Volume: 13 (6)      Pages from: 1429  to: 1434

KeyWords: Lithography; Polymerization; Resolution; Sub-diffraction; Triplet state
DOI: 10.1002/cphc.201200006

Citations: 30
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