Scientific Results

Photopolymerization inhibition dynamics for sub-diffraction direct laser writing lithography

Year: 2012

Authors: Harke B., Bianchini P., Brandi F., Diaspro A.

Autors Affiliation: Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy; Department of Physics, University of Genova, 16146 Genova, Italy

Abstract: Selective inhibition of the polymerization leads to sub-diffraction feature sizes in direct writing lithography-a principle based on the idea of stimulated emission depletion (STED) microscopy. However, the detailed understanding of the inhibition process is a key point to further enhance the resolution of the system. The authors present experiments focused on the time dynamics of the inhibition process, clarifying possible photophysical pathways.

Journal/Review: CHEMPHYSCHEM

Volume: 13 (6)      Pages from: 1429  to: 1434

KeyWords: Lithography; Polymerization; Resolution; Sub-diffraction; Triplet state
DOI: 10.1002/cphc.201200006

Citations: 21
data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2019-11-10
References taken from IsiWeb of Knowledge: (subscribers only)
Connecting to view paper tab on IsiWeb: Click here
Connecting to view citations from IsiWeb: Click here

English