Polymerization inhibition by triplet state absorption for nanoscale lithography
Authors: Harke B., Dallari W., Grancini G., Fazzi D., Brandi F., Petrozza A., Diaspro A.
Autors Affiliation: Department of Nanophysics, Istituto Italiano di Tecnologia (IIT), Via Morego 30, 16163 Genova, Italy; Center for Nano Science and Technology at PoliMi, Istituto Italiano di Tecnologia (IIT), Via Giovanni Pascoli 70/3, 20133 Milan, Italy; Dipatimento di Fisica, Universita\’ Degli Studi di Genova, via Dodecaneso 13, 16153, Genova, Italy
Abstract: The diffraction limit in direct-laser-writing (DLW) lithography can be circumvented by selective inhibition of the polymerization. By combining nanosecond transient absorption spectroscopy and density functional theory it is demonstrated that polymerization inhibition is possible by a direct absorption of the lowest triplet state. Polymerization inhibition by triplet state absorption (TSA) has the potential to bring DLW lithography into the nanometer scale. Copyright
Journal/Review: ADVANCED MATERIALS (WEINH., PRINT)
Volume: 25 (6) Pages from: 904 to: 909
KeyWords: Stimulated emission depletion (STED); Reversible saturable optical fluorescence transition (RESOLFT); Isopropyl thioxanthone (ITX); 7-diethylamino-3-thenoylcoumarin (DETC); Photoinduced absorptionDOI: 10.1002/adma.201204141