The resonant multi-pulse ionization injection
Authors: Tomassini P., De Nicola S., Labate L., Londrillo
P., Fedele R., Terzani D., Gizzi L.A.
Autors Affiliation: Intense Laser Irradiation Laboratory, INO-CNR, Pisa, 56124, Italy; Dip. Fisica, Universita
Abstract: The production of high-quality electron bunches in Laser Wa
ke Field Acceleration relies on the
possibility to inject ultra-low emittance bunches in the pl
asma wave. In this paper we present a new
bunch injection scheme in which electrons extracted by ioni
zation are trapped by a large-amplitude
plasma wave driven by a train of resonant ultrashort pulses.
In the REsonant Multi-Pulse Ionization
(REMPI) injection scheme, the main portion of a single ultra
short (e.g Ti:Sa) laser system pulse is
temporally shaped as a sequence of resonant sub-pulses, whi
le a minor portion acts as an ionizing
pulse. Simulations show that high-quality electron bunche
s with normalized emittance as low as
mrad and 0.65% energy spread can be obtained with a single present-day 100T W-class Ti:Sa laser system.
Journal/Review: PHYSICS OF PLASMAS
Volume: 24 Pages from: 1 to: 9
More Information: College of Natural Resources, University of California Berkeley, CNR. 653782–EuPRAXIA. – The research leading to these results has received funding from the European Union’s Horizon 2020 Research and Innovation Program under Grant Agreement No. 653782–EuPRAXIA. The authors also acknowledge financial support from the ELI-ITALY Network funded by CNR. They would like to thank CNAF-INFN for access to computational resources. Finally, the authors acknowledge support from Manuel Kirchen from Hamburg University for his help about the FB-PIC code.KeyWords: plasma; laser; electron transport; ionization; DOI: 10.1063/1.5000696Citations: 5data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2020-02-16References taken from IsiWeb of Knowledge: (subscribers only)