Few layered MoS2 lithography with an AFM tip: description of the technique and nanospectroscopy investigations
Authors: Donarelli M., Perrozzi F., Bisti F., Paparella F., Feyer V., Ponzoni A., Gonchigsuren M., Ottaviano L.
Autors Affiliation: Department of Physical and Chemical Sciences, University of L’Aquila, Via Vetoio 10, 67100 L’Aquila, Italy; Sincrotrone Trieste S.C.p.A., NanoESCA Beamline, 34012 Basovizza, Trieste, Italy; CNR-INO Brescia, Via Branze 38, 25123 Brescia, Italy; School of Applied Sciences, MUST, Bagatoiruu, Ulaanbaatar 14191, Mongolia; CNR-SPIN, UOS L’Aquila, Via Vetoio 10, 67100 L’Aquila, Italy
Abstract: A novel technique to lithograph the MoS2 surface is described here. Mechanically exfoliated MoS2 flakes have been patterned with an atomic force microscope tip. After the patterning process, the lithographed areas have been removed by selective chemical etching. The electronic properties of the MoS2 flakes have been analyzed with spatially resolved photoelectron spectroscopy, with tunable incident photon energy, provided by a synchrotron light source. Tens of meV core level shifts can be recorded in relation to the flakes edges, coming from both the exfoliation and from the lithography.
Volume: 7 (26) Pages from: 11453 to: 11459
KeyWords: NANOFABRICATION; FORCE MICROSCOPY; EXFOLIATED MOS2; INDUCED LOCAL OXIDATION; DOI: 10.1039/c5nr02337hCitations: 18data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2020-10-25References taken from IsiWeb of Knowledge: (subscribers only)Connecting to view paper tab on IsiWeb: Click hereConnecting to view citations from IsiWeb: Click here