An ultrathin TiO2 blocking layer on Cd stannate as highly efficient front contact for dye-sensitized solar cells
Authors: Braga A., Baratto C., Colombi P., Bontempi E., Salvinelli G., Drera G., Sangaletti L.
Autors Affiliation: Ist Italiano Tecnol, Nanochem Dept, I-16163 Genoa, Italy; Univ Brescia, CNR IDASC SENSOR Lab, I-25131 Brescia, Italy; Univ Brescia, Dept Informat Engn, I-25131 Brescia, Italy; Ctr Coating CSMT Gest Scarl, I-25123 Brescia, Italy; Univ Brescia, INSTM, I-25133 Brescia, Italy; Univ Brescia, Chem Technol Lab, I-25133 Brescia, Italy; Univ Cattolica Sacro Cuore, I LAMP, I-25121 Brescia, Italy; Univ Cattolica Sacro Cuore, Dipartimento Matemat & Fis, I-25121 Brescia, Italy
Abstract: An engineered multilayer structure of platinum-cadmium stannate-titanium oxide (Pt-CTO-TO), with different TO layer thickness (in the range 1-5 nm), has been grown at 400 degrees C on glass substrates by RF magnetron sputtering, following a 2-step procedure without breaking vacuum. To produce an alternative and reliable front contact for dye sensitized solar cells (DSCs), morphology and composition of a TO blocking layer have been studied, paying particular attention to the oxide-oxide (CTO-TO) interface characteristics. The influence of the metallic mesh on the transparent conductive oxide sheet resistance has also been considered. A sputtered CTO layer shows a high average transmittance, over 90%. The Pt mesh yields a drastic reduction in the series resistance, almost one order, without affecting the optical properties. The ultrathin blocking layer of Ti oxide prevents charge recombination, improving the overall performance of the solar cells: +86% in efficiency, +50% in short circuit current, with respect to bare CTO.
Volume: 15 (39) Pages from: 16812 to: 16818
KeyWords: CONDUCTING GLASS/TIO2 INTERFACESDOI: 10.1039/c3cp52250dCitations: 17data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2022-06-19References taken from IsiWeb of Knowledge: (subscribers only)Connecting to view paper tab on IsiWeb: Click hereConnecting to view citations from IsiWeb: Click here