Scientific Results

Micron and submicron electron beam lithography by the monoresist technique.

Year: 1987

Authors: Gentili M., Petrocco G., Lucchesini A., Chiesa W.(1), Ronzoni F.(1), D’Amico A.(2)

Autors Affiliation: IESS – CNR – Roma – Italy;
(1)Selenia Industrie Elettroniche Associate S.p.A. – Roma – Italy;
(2)Diparlimento di lngegneria Elettrica. Universit√† di l’Aquila – L’Aquila – Italy.

Abstract: In this paper we show the latest results obtained at the Istituto di Elettronica dello Stato Solido of the C.N.R., concerning the realization of micron and submicron metallic patterns obtained by both the electron beam lithography and either the lift-off or the electroplating technique. All the results have been achieved by using the PMMA resist. General considerations on the lithographic techniques, resist characteristics and some electron resist patterns are presented and commented.

Journal/Review:

Volume: XVII      Pages from: 65  to: 71

More Information: ISSN: 0391-3155
LCCN: 76640462
KeyWords: electron beam lithography; electroplating; lift-off; electron scattering;

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