High-quality 5 GeV electron bunches with resonant multi-pulse ionization injection.

Year: 2020

Authors: Tomassini P., Terzani D., Baffigi F., Brandi F., Fulgentini L., Koester P., Labate L., Palla D., Gizzi L.A.

Autors Affiliation: Intense Laser Irradiation Laboratory, INO-CNR, Pisa, Italy

Abstract: The production of high-quality electron bunches in laser wakefield acceleration relies on the possibility of injecting ultra-low emittance bunches in the plasma wave. A new bunch injection scheme (resonant multi-pulse ionization, ReMPI) has been conceived and studied, in which electrons extracted by ionization are trapped by a large-amplitude plasma wave driven by a train of resonant ultrashort pulses. Such a train of pulses can be obtained in a very efficient, compact and stable way, by phase manipulation in the laser front-end. The ReMPI injection scheme relies on currently available laser technology and is being considered for the implementation of future compact x-ray free electron laser schemes. Simulations show that high-quality electron bunches with an energy of up to 5 GeV and a peak current exceeding 2 kA, with normalized emittance of below 0.1 mm x mrad and a slice energy spread of below 0.1%, can be obtained with a single stage.


Volume: 62      Pages from: 014010-1  to: 014010-8

More Information: The research leading to these results has received funding from the EU Horizon 2020 Research and Innovation Program under Grant Agreement No. 653782 EuPRAXIA. This project has received financial support from the CNR funded Italian research Network ELI-Italy.
KeyWords: laser-plasma acceleration; high-brightness beams; resonant multi-pulse ionization injection; multi-pulse laser wake field acceleration; free electron lasers;
DOI: 10.1088/1361-6587/ab45c5