Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

Year: 2016

Authors: Serra E., Bawaj M., Borrielli A., Di Giuseppe G., Forte S., Kralj N., Malossi N., Marconi L., Marin F., Marino F., Morana B., Natali R., Pandraud G., Pontin A., Prodi G.A., Rossi M., Sarro P.M., Vitali D., Bonaldi M.

Autors Affiliation: Ist Nazl Fis Nucl, TIFPA, I-38123 Povo, TN, Italy; Delft Univ Technol, Else Kooi Lab, NL-2628 Delft, Netherlands; Univ Camerino, Sch Sci & Technol, Phys Div, I-62032 Camerino, MC, Italy; Ist Nazl Fis Nucl, Sez Perugia, I-06123 Perugia, Italy; Nanosci Trento FBK Div, Inst Mat Elect & Magnetism, I-38123 Povo, TN, Italy; Univ Trento, Dipartimento Fis, I-38123 Povo, TN, Italy; Univ Firenze, Dipartimento Fis & Astron, Via Sansone 1, I-50019 Sesto Fiorentino, FI, Italy; Ist Nazl Fis Nucl, Sez Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, FI, Italy; LENS, Via Carrara 1, I-50019 Sesto Fiorentino, FI, Italy; CNR, INO, Lgo Enrico Fermi 6, I-50125 Florence, Italy.

Abstract: In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 x 10(6) were measured at cryogenic temperatures, and in a Fabry-Perot cavity, where an optical finesse up to 50000 has been observed. (C) 2016 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

Journal/Review: AIP ADVANCES

Volume: 6      Pages from: 065004-1  to: 065004-8

More Information: This work has been supported by MIUR (PRIN 2010-2011) and by INFN (HUMOR project). A.B. acknowledges support from the MIUR under the “FIRB-Futuro in ricerca 2013” funding program, project code RBFR13QUVI.
KeyWords: microfabrication, optomechanics, resonators, cavity, noise, light
DOI: 10.1063/1.4953805

Citations: 26
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