Complex refractive index variation in proton-damaged diamond

Year: 2012

Authors: Lagomarsino S., Olivero P., Calusi S., Monticone Gatto D., Giuntini L., Massi M., Sciortino S., Sytchkova A., Sordini A., Vannoni M.

Autors Affiliation: Energetics Department and INFN Sezione di Firenze, University of Firenze, via Sansone 1, 50019 Sesto Fiorentino, Firenze, Italy;
Experimental Physics Department and “Nanostructured Interfaces and Surfaces” Centre of Excellence, University of Torino, via P. Giuria 1, 10125 Torino, Italy;
INFN Sezione di Torino, via P. Giuria 1, 10125 Torino, Italy;
Consorzio Nazionale Interuniversitario per le Scienze Fisiche della Materia (CNISM), Italy;
Physics Department and INFN Sezione di Firenze, University of Firenze (Italy), via Sansone 1, 50019 Sesto Fiorentino, Firenze, Italy;
ENEA, Optical Coatings Laboratory, via Anguillarese 301, 00123 Roma, Italy;
CNR, Istituto Nazionale di Ottica (INO), Largo E. Fermi 6, 50125 Arcetri, Firenze, Italy

Abstract: An accurate control of the optical properties of single crystal diamond during microfabrication processes such as ion implantation plays a crucial role in the engineering of integrated photonic devices. In this work we present a systematic study of the variation of both real and imaginary parts of the refractive index of single crystal diamond, when damaged with 2 and 3 MeV protons at low-medium fluences (range: 10(15) – 10(17) cm(-2)). After implanting in 125 x 125 mu m(2) areas with a scanning ion microbeam, the variation of optical pathlength of the implanted regions was measured with laser interferometric microscopy, while their optical transmission was studied using a spectrometric set-up with micrometric spatial resolution. On the basis of a model taking into account the strongly non-uniform damage profile in the bulk sample, the variation of the complex refractive index as a function of damage density was evaluated. (c) 2012 Optical Society of America

Journal/Review: OPTICS EXPRESS

Volume: 20 (17)      Pages from: 19382  to: 19394

More Information: This work is supported by the FARE experiment of Istituto Nazionale di Fisica Nucleare (INFN) and by the FIRB – Futuro in Ricerca 2010 grant n. D11J11000450001 funded by the I talian Ministry of Instruction, University and Research (MIUR), which are gratefully acknowledged.
KeyWords: Channel Wave-guides; Ion-implantation; Volume Expansion; Microprobe; Microstructures; Fabrication; Facility
DOI: 10.1364/OE.20.019382

Citations: 20
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