Nanoimprint lithography for nanophotonics in silicon

Year: 2008

Authors: Bruinink C. M., Burresi M., Boer M.J. de, Segerink F.B., Jansen H.V., Berenschot E., Reinhoudt D.N., Huskens J., Kuipers L.

Autors Affiliation: Molecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, NL-7500 AE Enschede, The Netherlands; Transducer Science & Technology, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, NL-7500 AE Enschede, The Netherlands; Optical Sciences, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, NL-7500 AE Enschede, The Netherlands, and Center for Nanophotonics, FOM Institute for Atomic, and Molecular Physics (AMOLF), Kruislaan 407, NL-1098 SJ Amsterdam, The Netherlands

Abstract: A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.

Journal/Review: NANO LETTERS

Volume: 8 (9)      Pages from: 2872  to: 2877

More Information: This research was supported by the MESA+ Institute for Nanotechnology and is part of the Strategic Research Orientations \”Advanced Photonic Structures\” and \”Nanofabrication\”. This work was also partially supported by NanoNed, a nanotechnology program of the Dutch Ministry of Economic Affairs. Of the CMAL/MESA+, Mark A. Smithers is acknowledged for operating the high-resolution SEM.
DOI: 10.1021/nl801615c

Citations: 20
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