Resolution limitation in EBL optical grating fabrication on InGaAsP/InP substrate
Year: 1990
Authors: GENTILI M., GRELLA L., LUCCHESINI A., MENEGHINI G., SCOPA L.
Autors Affiliation: IESS – CNR Roma;
CSELT, Torino.
Journal/Review: JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS
More Information: ISSN: 0393-2648KeyWords: Electron beam lithography; InGaAsP; Laser diode; Monte Carlo simulation; Electron scattering