Fabrication of hybrid superconductor-semiconductor nanostructures by integrated UV-AFM lithography

Year: 1997

Authors: Pingue P., Lazzarino M., Beltram F., Cecconi C., Baschieri P., Frediani C., Ascoli C.

Autors Affiliation: SCUOLA NORMALE SUPER PISA,PIAZZA CAVALIERI, 7 – 56126 PISA,ITALY
INFM,LAB NAZL TASC, I-34012 TRIESTE
CNR,IST BIOFISICA, I-56127 PISA – CNR di Pisa

Abstract: Hybrid superconductor–semiconductor (S–Sm) nanostructures were fabricated by integrating standard ultraviolet photolithography and direct patterning of photoresist with an atomic force microscope (AFM). This novel technology was used to fabricate Nb–InAs–Nb weak links comparable in length to the coherence length. These structures exhibit high critical currents up to 10 μA/μm in planar geometry at 0.3 K. The fabrication protocol is based on the modification of photolithographically defined patterns by AFM static ploughing of the photoresist. Wet chemical etching is subsequently used for the definition of nanoscale S–Sm–S bridges. Additionally Lift-off procedures allowed the fabrication of submicron superconducting bridges. Successful fabrication of the nanostructures was verified by electrical characterization and by AFM and scanning electron microscope structural characterization.

Journal/Review: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. B, MICROELECTRONICS AND NANOMETER STRUCTURES

Volume: 15 (4)      Pages from: 1398  to: 1401

KeyWords: afm; nanolitoraphy;
DOI: 10.1116/1.589547

Citations: 19
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