Scanning probe nanoimprint lithography

Year: 2010

Authors: Dinelli F., Menozzi C., Baschieri P., Facci P., Pingue P.

Autors Affiliation: IPCF, Consiglio Nazionale delle Ricerche, CNR Campus, Via G. Moruzzi 1, Pisa PI 56100, Italy;
CNR-INFM S3 National Research Center on Nanostructure and BioSystems at Surfaces, Via Campi 213/a, 41100 Modena, Italy;
NEST, Scuola Normale Superiore and CNR-INFM, Piazza San Silvestro 12, I-56127 Pisa, Italy;
Dipartimento di Fisica,Universit`a di Modena e Reggio Emilia, Via Campi 213/a,
41100 Modena, Italy

Abstract: The present paper reports on a novel lithographic approach at the nanoscale level, which is based on scanning probe microscopy (SPM) and nanoimprint lithography (NIL). The experimental set-up consists of an atomic force microscope (AFM) operated via software specifically developed for the purpose. In particular, this software allows one to apply a predefined external load for a given lapse of time while monitoring in real-time the relative distance between the tip and the sample as well as the normal and lateral force during the embossing process. Additionally, we have employed AFM tips sculptured by means of focused ion beam in order to create indenting tools of the desired shape. Anti-sticking layers can also be used to functionalize the tips if one needs to investigate the effects of different treatments on the indentation and de-molding processes. The lithographic capabilities of this set-up are demonstrated on a polystyrene NIL-patterned sample, where imprinted features have been obtained upon using different normal load values for increasing time intervals, and on a thermoplastic polymer film, where the imprint process has been monitored in real-time.

Journal/Review: NANOTECHNOLOGY

Volume: 21 (7)      Pages from: 075305  to: 075305

KeyWords: AFM; NANOLITOGRAPHY; FIB
DOI: 10.1088/0957-4484/21/7/075305

Citations: 13
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