Light induced patterning of poly(dimethylsiloxane) microstructures

Year: 2010

Authors: Miccio L., Paturzo M., Finizio A., Ferraro P.

Autors Affiliation: Istituto Nazionale di Ottica del CNR (INO-CNR)Via Campi Flegrei, 34 – 80078 – Pozzuoli (Na) Italy; Istituto di Cibernetica “E Caianiello” Via Campi Flegrei, 34 – 80078 – Pozzuoli (Na) Italy

Abstract: A new method for direct patterning of Poly(dimethylsiloxane) (PDMS) microstructures is developed by taking advantage of photorefractive effect in a functionalized substrate. Here we show that when a x-cut Iron doped Lithium Niobate (LN) crystal is exposed to appropriate structured laser light, a charge density pattern builds-up in the crystal and a space charge field arise that is able to induce self-patterning of the PDMS liquid film deposited on its surface via the dielectrophoretic effects. Proper heating treatment allows to achieve polymeric linking process creating a solid and stable PDMS microstructures. The self-patterned structures replicate the illuminating light pattern. We show that 1D and 2D patterning of PDMS gratings can be achieved. This new soft-lithographic approach can pave the way for realizing PDMS micro-structures with high degree of flexibility that avoids the need of moulds fabrication. (C) 2010 Optical Society of America

Journal/Review: OPTICS EXPRESS

Volume: 18 (11)      Pages from: 10947  to: 10955

More Information: This work is supported by Intesa di programma MIUR/CNR per il Mezzogiorno. Authors would like to thank Prof. Eusebio Bernabeu and Prof. Luis Miguel Sanchez, Universidad Complutense – Departamento de Optica of Madrid, for helpful discussions and suggestions and for the performing confocal microscope measurements.
KeyWords: Decal Transfer Lithography; Photorefractive Crystals; Microfluidic Systems; Fabrication; Resolution; Polydimethylsiloxane; Elastomer; Liquid; Array
DOI: 10.1364/OE.18.010947

Citations: 25
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