Modulating the thickness of the resist pattern for controlling size and depth of submicron reversed domains in lithium niobate

Year: 2006

Authors: Ferraro P., Grilli S.

Autors Affiliation: CNR – Istituto Nazionale di Ottica Applicata (INOA) del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy

Abstract: In this letter the electric field overpoling is used in combination with two-dimensional resist gratings exhibiting modulated topography and obtained by moire interference lithography. The technique allows one to fabricate shallow submicron domains with lateral size and depth modulated according to the resist profile. Simulations of the electric field distribution in the crystal, in this specific poling configuration, are performed to interpret the mechanism leading to the formation of those surface domains. The results show that in principle complex domain structures could be designed for applications in the field of photonic crystals. (c) 2006 American Institute of Physics.

Journal/Review: APPLIED PHYSICS LETTERS

Volume: 89 (13)      Pages from: 133111-1  to: 133111-3

More Information: This research was partially funded by the MIUR Project No. 77 DD N.1105/2002 and by the MIUR within the FIRB project Microdipositivi fotonici in niobato di litio N. RBNE01KZ94. The authors are grateful to Alenia-Aeronautica for providing analysis by SEM.
KeyWords: Lithography; Crystals
DOI: 10.1063/1.2357928

Citations: 17
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