Double-face and submicron two-dimensional domain patterning in congruent lithium niobate

Year: 2006

Authors: Grilli S., Ferraro P., Sansone L., Paturzo M., De Nicola S., Pierattini G., De Natale P.

Autors Affiliation: CNR – Istituto Nazionale di Ottica Applicata, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy;
Istitute of Cybernetics – CNR, 80078 Pozzuoli (NA), Italy;
LENS – European Laboratory for Nonlinear Spectroscopy, Sesto Firentino (FI) 50019, Italy

Abstract: We report on the simultaneous fabrication of two-dimensional submicron engineered domain patterns on both crystal faces, in congruent lithium niobate. The fabrication technique is based on interference photolithography, which allows short pitch over large areas, followed by electric field poling performed in overpoling regime. Experimental results for different domain pattern geometries, on the two crystal faces, are reported. These structures could be useful for short-wavelength frequency conversion and Bragg gratings applications. The moire effect is used in the lithographic process to fabricate more complex structures which could find application in photonic bandgap devices.

Journal/Review: IEEE PHOTONICS TECHNOLOGY LETTERS

Volume: 18 (1-4)      Pages from: 541  to: 543

More Information: This work was supported in part by the Ministero dell’Istruzione dell’Università e della Ricerca (MIUR) within the Fondo per gli Investimenti della Ricerca di Base project “Microdispositivi totonici in Niobato di Litio n. RBNE01KZ94” and in part by the project MIUR n.77 DD N.1105/2002 “Circuiti fotonici inte-grati per le telecomunicazioni ottiche e la sensoristica.” S. Grilli, P. Ferraro, L. Sansone, and P. De Natale are with the National Institute of Applied Optics–CNR, Pozzuoli (NA) 80078, Italy (e-mail: grilli@ino.it).
KeyWords: Complex structure; Congruent lithium niobate; Crystal face; Different domains; Domain pattern; Electric field poling; Fabrication technique; Frequency conversions; Interference lithography; Lithium niobate; Lithographic process; Microstructure fabrication; Overpoling regimes; Photonic bandgap devices; Short-wavelength; Submicron; Two-dimensional domain, Electric field measurement; Electric fields; Fabrication; Lithography; Microstructure; Niobium compounds; Photonic devices; Photoresists; Two dimensional, Lithium
DOI: 10.1109/LPT.2005.863626

Citations: 8
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