Silver high-aspect-ratio micro- and nanoimprinting for optical applications
Year: 2009
Authors: Buzzi S., Galli M., Agio M., Loffler J.F.
Autors Affiliation: ETH, Dept Mat, Lab Met Phys & Technol, CH-8093 Zurich, Switzerland; Univ Pavia, Dipartimento Fis A Volta, I-27100 Pavia, Italy; ETH, Phys Chem Lab, CH-8093 Zurich, Switzerland.
Abstract: Metal direct nanoimprinting is a fabrication technique based on plastic deformation of ductile metals such as silver and gold pressed into a structured rigid mold. While this process can be exploited to manufacture metallic micro- and nanoparts by removing the mold after processing, it can also be used as a metallization method for producing two-dimensional metallo-dielectric composites. Dense silver-pillar arrays with diameters down to 140 nm, aspect ratios up to 13, and excellent uniformity over large areas were fabricated. The sample quality was confirmed by near-infrared optical reflectances of Si-Ag photonic crystals, which showed strong collective surface plasmon-polariton resonances.
Journal/Review: APPLIED PHYSICS LETTERS
Volume: 94 (22) Pages from: 223115-1 to: 223115-3
More Information: The authors are grateful to A. Sologubenko, L. Zhao, R. Giannini, M. Liscidini, and L. C. Andreani for technical support and helpful discussions. M. A. thanks V. Sandoghdar for continuous support. This work was financed by the ETH Zurich Initiative on Composite Doped Metamaterials (CDM) and by ETH research Grant No. TH-29/07-3.KeyWords: composite materials; ductility; infrared spectra; metallisation; nanotechnology; optical fabrication; photonic crystals; plastic deformation; polaritons; reflectivity; silicon; silver; surface plasmon resonanceDOI: 10.1063/1.3142426Citations: 24data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2024-10-20References taken from IsiWeb of Knowledge: (subscribers only)