Third-harmonic light polarization control in magnetically resonant silicon metasurfaces

Year: 2021

Authors: Tognazzi A., Okhlopkov K.I., Zilli A., Rocco D., Fagiani L., Mafakheri E., Bollani M., Finazzi M., Celebrano M., Shcherbakov M.R., Andrey A. Fedyanin; De Angelis C.

Autors Affiliation: Univ Brescia, Dept Informat Engn, Via Branze 38, I-25123 Brescia, Italy; CNR INO Natl Inst Opt, Via Branze 45, I-25123 Brescia, Italy; Lomonosov Moscow State Univ, Fac Phys, Moscow 119991, Russia; Politecn Milan, Dept Phys, Piazza Leonardo Da Vinci 32, I-20133 Milan, Italy; CNR IFN, LNESS Lab, Via Anzani 42, I-22100 Como, Italy.

Abstract: Nonlinear metasurfaces have become prominent tools for controlling and engineering light at the nanoscale. Usually, the polarization of the total generated third harmonic is studied. However, diffraction orders may present different polarizations. Here, we design an high quality factor silicon metasurface for third harmonic generation and perform back focal plane imaging of the diffraction orders, which present a rich variety of polarization states. Our results demonstrate the possibility of tailoring the polarization of the generated nonlinear diffraction orders paving the way to a higher degree of wavefront control.

Journal/Review: OPTICS EXPRESS

Volume: 29 (8)      Pages from: 11605  to: 11612

More Information: Ministry of Education and Science of the Russian Federation (14.W03.31.0008); European Commission (828890, 899673); Ministero dellŽIstruzione, dellŽUniversita e della Ricerca (2017MP7F8F).
KeyWords: metasurface, third harmonic, nonlinear diffraction, EBL
DOI: 10.1364/OE.419829

Citations: 14
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