Photobleaching of polydiacetylene waveguides: A characterization of the process and patterning of optical elements
Year: 1997
Authors: Palchetti L., Li Q., Giorgetti E., Grando D., Sottini S.
Autors Affiliation: Istituto di Ricerca sulle Onde Elettromagnetiche, Consiglio Nazionale delle Ricerche, Via Panciatichi 64, Firenze, Italy; Shanghai Jiao Tong University, 1945 Huan Shan Road, Shanghai, 200030, China; Politecnico de Bari, Via Orabona 4, Bari, Italy
Abstract: The photobleaching process of poly-3butoxyl-carbonyl-methyl-urethane (poly-3BCMU) waveguides by means of an UV lamp and the 488-nm line of an Ar laser is characterized and modeled. The limits of the theory are discussed in light of experimental results, and we stress the role of the oxygen diffusion rate on the process. Finally, we adopt the photobleaching method to pattern a guided-wave micro-optic device and holographic diffraction gratings on spun poly-3BCMU films.
Journal/Review: APPLIED OPTICS
Volume: 36 (6) Pages from: 1204 to: 1212
KeyWords: Integrated optics; Nonlinear optics; Photobleaching; Polymer waveguidesDOI: 10.1364/AO.36.001204Citations: 14data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2024-11-17References taken from IsiWeb of Knowledge: (subscribers only)