Lateral shearing interferometer for measuring refractive index of silicon
Anno: 2003
Autori: Coppola G., Ferraro P., De Nicola S., Iodice M.
Affiliazione autori: Istituto Nazionale di Ottica Applicata, Sez. di Napoli, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy;
Istituto di Cibernetica “E. Caianiello” del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy
Abstract: A simple lateral shearing interferometer is proposed for measuring refractive index of thin parallel plate silicon sample. The rotating sample works as lateral shearing element. As the ample rotates a continuous lateral shearing is obtained owing to the change of the optical path difference (OPD) between the transmitted beam and that first reflected by the surface sample. The recorded interferometric signal is Fourier-transform analysed and the phase change is determined as a function of the rotating angle. If the thickness of the silicon sample is known the method provides accurate measurement of the refractive index.
Giornale/Rivista: PROCEEDINGS OF SPIE
Volume: 4829 Da Pagina: 338 A: 340
Parole chiavi: InterferometryDOI: 10.1117/12.526895Link per visualizzare la scheda su IsiWeb: Clicca qui