Phase-shifting point-diffraction interferometer developed by using the electro-optic effect in ferroelectric crystals
Anno: 2006
Autori: Paturzo M., Pignatiello F., Grilli S., De Nicola S., Ferraro P.
Affiliazione autori: CNR – Istituto Nazionale di Ottica Applicata and LENS European Laboratory for Non-Linear Spectroscopy, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy
Abstract: A novel and simple phase-shifting point-diffraction interferometer using a z-cut lithium niobate wafer is proposed. The pinhole is realized by an optical lithography process, aluminum deposition, and subsequent liftoff on the surface of the wafer. The phase shifting is obtained by inducing the electro-optic effect along the z crystal axis. We demonstrate experimentally the possibility of retrieving an aberrated wavefront. (c) 2006 Optical Society of America.
Giornale/Rivista: OPTICS LETTERS
Volume: 31 (24) Da Pagina: 3597 A: 3599
Parole chiavi: interferometry; metrology; phase measurementDOI: 10.1364/OL.31.003597Citazioni: 17dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2024-05-05Riferimenti tratti da Isi Web of Knowledge: (solo abbonati) Link per visualizzare la scheda su IsiWeb: Clicca quiLink per visualizzare la citazioni su IsiWeb: Clicca qui