Photoresist design for elastomeric light tunable photonic devices
Authors: Nocentini S., Martella D., Parmeggiani C., Wiersma D.
Autors Affiliation: European Laboratory for Non-Linear Spectroscopy (LENS), University of Florence, Via Nello Carrara 1, Sesto Fiorentino, 50019, Italy; Department of Chemistry ‘Ugo Schiff’, University of Florence, Via Della Lastruccia 3-13, Sesto Fiorentino, 50019, Italy; CNR-INO, Sede Secondaria di Sesto Fiorentino, Via Nello Carrara 1, Sesto Fiorentino, 50019, Italy
Abstract: An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swelling as a limiting factor of resolution. In this article, we reported a detailed study on the writing process with four liquid crystalline photoresists, in which the percentage of crosslinker is gradually increased. The experiments reveal that exploiting the crosslinking degree is a possible means in which to obtain suspended lines with good resolution, quite good rigidity, and good elasticity, thereby preserving the possibility of deformation by light irradiation.
Volume: 9 (7) Pages from: 525-1 to: 525-11
KeyWords: Crystalline materials; Elastomers; Liquids; Lithography; Photoresists, Azobenzene-containing polymer; Cross-linking degree; Direct laser writing; Light irradiations; Liquid crystalline; Liquid crystalline elastomers; Photonic structure; Tunable photonic devices, Photonic devicesDOI: 10.3390/ma9070525Citations: 14data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2019-08-18References taken from IsiWeb of Knowledge: (subscribers only)