The resonant multi-pulse ionization injection
Autori: Tomassini P., De Nicola S., Labate L., Londrillo P., Fedele R., Terzani D., Gizzi L.A.
Affiliazione autori: Intense Laser Irradiation Laboratory, INO-CNR, Pisa, 56124, Italy; Dip. Fisica, Universita
Abstract: The production of high-quality electron bunches in Laser Wake Field Acceleration relies on the possibility to inject ultra-low emittance bunches in the plasma wave. In this paper, we present a new bunch injection scheme in which electrons extracted by ionization are trapped by a large-amplitude plasma wave driven by a train of resonant ultrashort pulses. In the Resonant Multi-Pulse Ionization injection scheme, the main portion of a single ultrashort (e.g., Ti: Sa) laser system pulse is temporally shaped as a sequence of resonant sub-pulses, while a minor portion acts as an ionizing pulse. Simulations show that high-quality electron bunches with normalized emittance as low as 0.08 mm x mrad and 0.65% energy spread can be obtained with a single present-day 100TW-class Ti: Sa laser system. Published by AIP Publishing.
Giornale/Rivista: PHYSICS OF PLASMAS
Volume: 24 (10) Da Pagina: 103120-1 A: 103120-9
Maggiori informazioni: College of Natural Resources, University of California Berkeley, CNR. 653782–EuPRAXIA. – The research leading to these results has received funding from the European Union’s Horizon 2020 Research and Innovation Program under Grant Agreement No. 653782–EuPRAXIA. The authors also acknowledge financial support from the ELI-ITALY Network funded by CNR. They would like to thank CNAF-INFN for access to computational resources. Finally, the authors acknowledge support from Manuel Kirchen from Hamburg University for his help about the FB-PIC code.Parole chiavi: plasma; laser; electron transport; ionization; DOI: 10.1063/1.5000696Citazioni: 20dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2021-09-19Riferimenti tratti da Isi Web of Knowledge: (solo abbonati) Link per visualizzare la scheda su IsiWeb: Clicca quiLink per visualizzare la citazioni su IsiWeb: Clicca qui