High power pulsed millimeter laser raman generation in CH3F

Anno: 1997

Autori: Marchetti S., Martinelli M., Simili R., D’Amato F., Giorgi M.

Affiliazione autori: Ist. Fis. Atomica e Molec. del CNR, Via del Giardino 7, 56127 Pisa, Italy; ENEA Dipartimento Innovazione, Settore Fisica Applicata, Via Fermi 27, 00044 Frascati, Italy

Abstract: This work reports about the production of millimeter Raman pulsed emission obtained in CH,F by means of a high
pressure continuously tunable CO, laser. Some new strong lines are observed with peak power up to the kW range.
The results are in agreement with the Raman scattering theory. The emissions are observed by tuning the CO, laser over several GHz.

Giornale/Rivista: OPTICS COMMUNICATIONS (PRINT)

Volume: 133 (1/6)      Da Pagina: 310  A: 314

Parole chiavi: Carbon dioxide lasers; Fluorocarbons; Gas lasers; Laser pulses; Laser tuning; Raman scattering; Millimetre Raman pulsed emission; High power lasers
DOI: 10.1016/S0030-4018(96)00493-2

Citazioni: 2
dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2024-04-21
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