High power pulsed millimeter laser raman generation in CH3F
Anno: 1997
Autori: Marchetti S., Martinelli M., Simili R., D’Amato F., Giorgi M.
Affiliazione autori: Ist. Fis. Atomica e Molec. del CNR, Via del Giardino 7, 56127 Pisa, Italy; ENEA Dipartimento Innovazione, Settore Fisica Applicata, Via Fermi 27, 00044 Frascati, Italy
Abstract: This work reports about the production of millimeter Raman pulsed emission obtained in CH,F by means of a high
pressure continuously tunable CO, laser. Some new strong lines are observed with peak power up to the kW range.
The results are in agreement with the Raman scattering theory. The emissions are observed by tuning the CO, laser over several GHz.
Giornale/Rivista: OPTICS COMMUNICATIONS (PRINT)
Volume: 133 (1/6) Da Pagina: 310 A: 314
Parole chiavi: Carbon dioxide lasers; Fluorocarbons; Gas lasers; Laser pulses; Laser tuning; Raman scattering; Millimetre Raman pulsed emission; High power lasersDOI: 10.1016/S0030-4018(96)00493-2Citazioni: 2dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2024-04-21Riferimenti tratti da Isi Web of Knowledge: (solo abbonati) Link per visualizzare la scheda su IsiWeb: Clicca quiLink per visualizzare la citazioni su IsiWeb: Clicca qui